Micro/Nano-Machining Research and Education Center, Tohoku University

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FacilitiesSample preparation equipment

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Sample preparation equipment

FIB

FIB
Manufacturer name (model)Hitachi High-Tech (SMI500)
ApplicationFine processing by local etching
Sample sizeMaximum □20 mm
Application exampleCross-section sample preparation for SEM observation
Main specificationsResolution: 12 nm, carbon deposition possible
Remarks

Ion coater

Ion coater
Manufacturer name (model)Hitachi Science Systems (E-1030)
Materials that can be depositedAu, Pt-Pd
Sample sizeMaximum ⌀2 inch
ProcessGasAr
Deposition temperatureRoom temperature
OthersSEMCharge-up prevention film during SEM observation
Remarks

Polishing SEM sample maker

Polishing SEM sample maker
Manufacturer name (model)LEICA (EM TXP)
UseMainly for SEM observation section sample preparation
Sample size Maximum □20 mm
Main specificationsSample cutting with a diamond blade is also possible.
Remarks

Ion milling SEM sample maker

Ion milling SEM sample maker
Manufacturer name (model)LEICA (EM TIC 3X)
ApplicationCross-section sample preparation mainly for SEM observation
Sample sizeMaximum □20 mm
Main specificationsSample surface milling by rotary stage Is also possible.
Remarks