Micro/Nano-Machining Research and Education Center, Tohoku University
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FacilitiesSample preparation equipment
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Sample preparation equipment
FIB
Manufacturer name (model) | Hitachi High-Tech (SMI500) |
Application | Fine processing by local etching
|
Sample size | Maximum □20 mm
|
Application example | Cross-section sample preparation for SEM observation |
Main specifications | Resolution: 12 nm, carbon deposition possible
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Remarks | |
Ion coater
Manufacturer name (model) | Hitachi Science Systems (E-1030)
|
Materials that can be deposited | Au, Pt-Pd |
Sample size | Maximum ⌀2 inch |
ProcessGas | Ar |
Deposition temperature | Room temperature
|
Others | SEMCharge-up prevention film during SEM observation |
Remarks | |
Polishing SEM sample maker
Manufacturer name (model) | LEICA (EM TXP) |
Use | Mainly for SEM observation section sample preparation
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Sample size |
Maximum □20 mm |
Main specifications | Sample cutting with a diamond blade is also possible.
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Remarks | |
Ion milling SEM sample maker
Manufacturer name (model) | LEICA (EM TIC 3X) |
Application | Cross-section sample preparation mainly for SEM observation |
Sample size | Maximum □20 mm
|
Main specifications | Sample surface milling by rotary stage Is also possible.
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Remarks | |