Micro/Nano-Machining Research and Education Center, Tohoku University
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FacilitiesSample preparation equipment
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Sample preparation equipment
FIB
| Manufacturer name (model) | Hitachi High-Tech (SMI500) |
| Application | Fine processing by local etching
|
| Sample size | Maximum □20 mm
|
| Application example | Cross-section sample preparation for SEM observation |
| Main specifications | Resolution: 12 nm, carbon deposition possible
|
| Remarks | |
Ion coater
| Manufacturer name (model) | Hitachi Science Systems (E-1030)
|
| Materials that can be deposited | Au, Pt-Pd |
| Sample size | Maximum ⌀2 inch |
| ProcessGas | Ar |
| Deposition temperature | Room temperature
|
| Others | SEMCharge-up prevention film during SEM observation |
| Remarks | |
SEM sample Polisher
| Manufacturer name (model) | LEICA (EM TXP) |
| Use | Mainly for SEM observation section sample preparation
|
| Sample size |
Maximum □20 mm |
| Main specifications | Sample cutting with a diamond blade is also possible.
|
| Remarks | |
SEM sample Ion milling
| Manufacturer name (model) | LEICA (EM TIC 3X) |
| Application | Cross-section sample preparation mainly for SEM observation |
| Sample size | Maximum □20 mm
|
| Main specifications | Sample surface milling by rotary stage Is also possible.
|
| Remarks | |
Tohoku University
