Micro/Nano-Machining Research and Education Center, Tohoku University

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FacilitiesSynthesis, heat treatment, doping

table of contents

Synthesis, heat treatment, doping

High-temp Oven

High-temp Oven
Manufacturer name (model)ADVANTEC (DRD360DA)
OtherTemperature range 50℃–650℃
Remarks

Lamp annealing furnace

Lamp annealing furnace
Manufacturer name (model)明純技術支援
Other
Remarks

Ion implantation

Ion implantation
Manufacturer name (model) ULVAC (IMX-3500)
Application (ApplicationFeatures)Injection of semiconductor dopant
Main specificationsIon species: B, P, As, Injection energy: 5–150 keV
Sample sizeMaximum ⌀8 inch
Others
Remarks

H2 anneal furnace

H2 anneal furnace
Manufacturer name (model) Koyo Thermo System (Model 200)
Application (feature)H2 annealing treatment
Main specificationsGas type: H2, N2
Sample size⌀2 inch
OthersMainly the sintering process of the transistor process
Remarks

RTA #1

RTA
Manufacturer name (model)Koyo Thermo System (RLA-1208-V)
UseDopant activation for source/drain formation
Process gasAr, N2
Workable materialsSi, SiO2, SiN
Sample sizeMaximum ⌀8 inch
Remarks