Micro/Nano-Machining Research and Education Center, Tohoku University
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FacilitiesSynthesis, heat treatment, doping
- table of contents
Synthesis, heat treatment, doping
High-temp Oven
Manufacturer name (model) | ADVANTEC (DRD360DA) |
Other | Temperature range 50℃–650℃ |
Remarks | |
Lamp annealing furnace
Manufacturer name (model) | 明純技術支援 |
Other | |
Remarks | |
Ion implantation
Manufacturer name (model)
| ULVAC (IMX-3500)
|
Application (ApplicationFeatures) | Injection of semiconductor dopant |
Main specifications | Ion species: B, P, As, Injection energy: 5–150 keV
|
Sample size | Maximum ⌀8 inch |
Others | |
Remarks | |
H2 anneal furnace
Manufacturer name (model) | Koyo Thermo System (Model 200) |
Application (feature) | H2 annealing treatment |
Main specifications | Gas type: H2, N2 |
Sample size | ⌀2 inch |
Others | Mainly the sintering process of the transistor process
|
Remarks | |
RTA #1
Manufacturer name (model) | Koyo Thermo System (RLA-1208-V)
|
Use | Dopant activation for source/drain formation |
Process gas | Ar, N2 |
Workable materials | Si, SiO2, SiN |
Sample size | Maximum ⌀8 inch |
Remarks | |