{"id":93,"date":"2022-01-07T11:08:49","date_gmt":"2022-01-07T02:08:49","guid":{"rendered":"https:\/\/web.tohoku.ac.jp\/mnc\/?page_id=93"},"modified":"2026-01-20T14:23:47","modified_gmt":"2026-01-20T05:23:47","slug":"equipment01","status":"publish","type":"page","link":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment01","title":{"rendered":"Lithography\/exposure\/drawing equipment"},"content":{"rendered":"<dl class=\"localnav\">\n\t<dt>table of contents<\/dt>\n\t<dd><ul><li><a href=\"\/mnc\/facilities\/equipment01\">Lithography\/exposure\/drawing equipment<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment02\">Film formation\/deposition<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment03\">Film processing\/etching<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment04\">Synthesis, heat treatment, doping<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment05\">Surface treatment<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment06\">Bonding, polishing, packaging<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment07\">Shape\/morphology observation, analysis<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment08\">Sample preparation equipment<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment09\">Electrical measurement<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment10\">Mechanical measurement<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment11\">Others<\/a><\/li><\/ul><\/dd>\n<\/dl>\n\n\n\n<h2>Lithography\/exposure\/drawing equipment<\/h2>\n\n\n\n<h3 id=\"equipment01-01\">EB Lithograpy<\/h3>\n\n\n\n<div class=\"wp-container-27 wp-block-columns\">\n<div class=\"wp-container-25 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/02-2.jpg\" alt=\"EB Lithograpy\" class=\"wp-image-812\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/02-2.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/02-2-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-26 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Type<\/th><td>Electron beam lithography\n<\/td>\n\t<\/tr><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>JEOL (JBX-6300SK)\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Light source<\/th><td>EB<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Resolution<\/th><td>50 nm<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u23002 inch, \u25a120 mm<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment01-02\">Laser lithography system #1<\/h3>\n\n\n\n<div class=\"wp-container-30 wp-block-columns\">\n<div class=\"wp-container-28 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/07.jpg\" alt=\"Laser lithography system #1\" class=\"wp-image-771\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/07.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/07-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-29 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Type<\/th><td>Laser lithography<\/td>\n\t<\/tr><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Heidelberg (DWL2000SD)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Light source<\/th><td>Semiconductor laser (405 nm) <\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Resolution<\/th><td>0.6 <span class=\"unit_micro\">\u03bc<\/span>m<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum \u25a19 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Other<\/th><td>Installed in the Micro-Machining building.\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment01-04\">Simple photo-mask maker(MM605AT)<\/h3>\n\n\n\n<div class=\"wp-container-33 wp-block-columns\">\n<div class=\"wp-container-31 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/10-1.jpg\" alt=\"Simple photo-mask maker(MM605AT)\" class=\"wp-image-796\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/10-1.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/10-1-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-32 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Type<\/th><td>1\/5 reduced exposure photo mask making machine (OHP mask negative)<\/td>\n\t<\/tr><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Nanotech (MM605)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Light source<\/th><td>Fluorescent lamp (30W x 3)\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Resolution<\/th><td>L\/S = about 200 <span class=\"unit_micro\">\u03bc<\/span>m<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Imaging dimensions: 59.4 x 59.4 mm<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>]Mask: OHP mask negative preparation by inkjet\/Emulsion mask, magnification: 0.2 times, field dimensions: 297 x 297 mm, exposure timer: 99.9 s (0.1 s)\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment01-06\">Mask aligner(SUSS, MA6\/BA6)#1,#2<\/h3>\n\n\n\n<div class=\"wp-container-36 wp-block-columns\">\n<div class=\"wp-container-34 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/08-1-1.jpg\" alt=\"Mask aligner(SUSS, MA6\/BA6)#1,#2\" class=\"wp-image-802\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/08-1-1.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/08-1-1-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-35 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Type<\/th><td>Mask aligner<\/td>\n\t<\/tr><tr>\n\t\t<th>Manufacturer name (model)<\/th><td> SUSS MicroTec (MA6)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Light source<\/th><td>Mercury lamp\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Resolution<\/th><td>1\u20132 <span class=\"unit_micro\">\u03bc<\/span>m<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum 6 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Mask size<\/th><td>2\u20137 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment01-07\">EVG Mask aligner<\/h3>\n\n\n\n<div class=\"wp-container-39 wp-block-columns\">\n<div class=\"wp-container-37 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/01-4.jpg\" alt=\"EVG Mask aligner\" class=\"wp-image-809\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/01-4.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/01-4-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-38 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Type<\/th><td>Mask aligner<\/td>\n\t<\/tr><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>EV group (EVG620)\n[<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Light source<\/th><td>Mercury lamp<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Resolution<\/th><td>1\u20132 <span class=\"unit_micro\">\u03bc<\/span>m<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u25a120 mm\u20136 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Mask size<\/th><td>2\u20137 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Bond alignment is possible.<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"yellow_no13\">Spray coater(Delta 80RC)<\/h3>\n\n\n\n<div class=\"wp-container-42 wp-block-columns\">\n<div class=\"wp-container-40 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-large\"><img src=\"\/mnc\/wp-content\/uploads\/floor_img\/spray-coater.jpg\" alt=\"Spray coater(Delta 80RC)\"\/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-41 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>SUSS(Delta 80RC)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Capable of handling wafers of 8 inch\u3000and\/or smaller<br>\n(Samples other than 8-inch wafers are affixed to an 8-inch wafer using Kapton tape before coating)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"yellow_no14\">Mask aligner#3(SUSS, MA8\/BA8)<\/h3>\n\n\n\n<div class=\"wp-container-45 wp-block-columns\">\n<div class=\"wp-container-43 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-large\"><img src=\"\/mnc\/wp-content\/uploads\/floor_img\/mask-aligner3.jpg\" alt=\"Mask aligner#3(SUSS, MA8\/BA8)\"\/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-44 wp-block-column\">\n<table>\n\t<tbody>\n\t<tr>\n\t\t<th>Manufacturer name (model)<\/th><td>SUSS MicroTec MA8\/BA8<\/td>\n\t<\/tr>\n<tr>\n\t\t<th>Light source<\/th><td>Mercury lamp\n(OSRAM HBO 1000 W)<\/td>\n\t<\/tr>\n<tr>\n\t\t<th>Resolution<\/th><td>2\u00b5m<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>2-inch or 8-inch (existing holder)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Mask size<\/th><td>3-inch or 9-inch (existing holder)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Minimum 1 inch to maximum 8 inche<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Alignment accuracy: 1 \u00b5m (nominal value)<br>\ni-line filter can be used<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"main_no31\">Lift-off EQP(LOB8)<\/h3>\n\n\n\n<div class=\"wp-container-48 wp-block-columns\">\n<div class=\"wp-container-46 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-large\"><img src=\"\/mnc\/wp-content\/uploads\/floor_img\/lift-off-eqp.jpg\" alt=\"Lift-off EQP(LOB8)\"\/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-47 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>ASAP(LOM8-000-12)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>2, 4, 6, 8-inch wafer<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Main specifications<\/th><td>Photoresist removal<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Solvents used: IPA and\/or NMP<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>","protected":false},"excerpt":{"rendered":"<p>table of contents Lithography\/exposure\/drawing equipment Film formation\/deposition Film processing\/etching Syn [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":12,"menu_order":10,"comment_status":"closed","ping_status":"closed","template":"","meta":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v20.0 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Lithography\/exposure\/drawing equipment | Facilities | Tohoku University Smart System Super Integration Research Center<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link 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