{"id":139,"date":"2022-01-12T10:51:04","date_gmt":"2022-01-12T01:51:04","guid":{"rendered":"https:\/\/web.tohoku.ac.jp\/mnc\/?page_id=139"},"modified":"2026-01-20T14:17:26","modified_gmt":"2026-01-20T05:17:26","slug":"equipment05","status":"publish","type":"page","link":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05","title":{"rendered":"Surface treatment"},"content":{"rendered":"<dl class=\"localnav\">\n\t<dt>table of contents<\/dt>\n\t<dd><ul><li><a href=\"\/mnc\/facilities\/equipment01\">Lithography\/exposure\/drawing equipment<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment02\">Film formation\/deposition<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment03\">Film processing\/etching<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment04\">Synthesis, heat treatment, doping<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment05\">Surface treatment<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment06\">Bonding, polishing, packaging<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment07\">Shape\/morphology observation, analysis<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment08\">Sample preparation equipment<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment09\">Electrical measurement<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment10\">Mechanical measurement<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment11\">Others<\/a><\/li><\/ul><\/dd>\n<\/dl>\n\n\n\n<h2>Surface treatment<\/h2>\n\n\n\n<h3 id=\"equipment05-01\">UV exposure<\/h3>\n\n\n\n<div class=\"wp-container-18 wp-block-columns\">\n<div class=\"wp-container-16 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/06-1.jpg\" alt=\"UV exposure\" class=\"wp-image-799\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/06-1.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/06-1-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-17 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Samco (UV-T)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Use<\/th><td>Removal of organic substances by UV + O<sub>3<\/sub>, UV cure by UV + N<sub>2<\/sub>\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Main specifications<\/th><td>Light source: low pressure mercury lamp (253.7, 184.9 nm), Stage temperature setting range: Room temperature to 300 \u2103\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Process gas<\/th><td>O<sub>3<\/sub>, O<sub>2<\/sub>, N<sub>2<\/sub>\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum \u2300200 mm, thickness 2 mm or less<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment05-02\">Two-fluid cleaner<\/h3>\n\n\n\n<div class=\"wp-container-21 wp-block-columns\">\n<div class=\"wp-container-19 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/05-2.jpg\" alt=\"Two-fluid cleaner\" class=\"wp-image-808\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/05-2.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/05-2-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-20 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Actes (ADE-3000S)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Use<\/th><td>Two-fluid spray cleaning device using water or organic solvent (IPA, etc.)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Main specifications<\/th><td>Wafer rotation speed: 0 to 3000 rpm, wafer swing angle: 0 to 40\u00b0\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u25a120 mm or 4 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment05-03\">HDMS treatment system<\/h3>\n\n\n\n<div class=\"wp-container-24 wp-block-columns\">\n<div class=\"wp-container-22 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/10-2.jpg\" alt=\"HDMS treatment system\" class=\"wp-image-815\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/10-2.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/10-2-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-23 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Self-made<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Use<\/th><td>Apply resist such as OFPR to the surface of the silicon wafer In some cases, surface treatment is more appropriate than OAP dripping. Since the series of treatments after washing with sulfuric acid hydrogen peroxide can be handled without touching the atmosphere, the possibility of resist coating failure is reduced.\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u25a120 mm\u20134 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment05-04\">Supercritical CO<sub>2<\/sub> drier<\/h3>\n\n\n\n<div class=\"wp-container-27 wp-block-columns\">\n<div class=\"wp-container-25 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/22.jpg\" alt=\"Supercritical CO2 drier\" class=\"wp-image-819\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/22.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/22-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-26 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>SC Fluids (CPD1100)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Application<\/th><td>Drying of MEMS device using supercritical<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum 4 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"main_no30\">Excimer exposure<\/h3>\n\n\n\n<div class=\"wp-container-30 wp-block-columns\">\n<div class=\"wp-container-28 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-large\"><img src=\"\/mnc\/wp-content\/uploads\/floor_img\/excimer-exposure.jpg\" alt=\"Excimer exposure\"\/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-29 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>M. D. COM inc<br>\n\uff08MEIRA-M-1-330\uff09<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Application<\/th><td>Cleaning and decomposition of minute organic matter<br>\nHydrophilic modification and adhesion enhancement<br>\nObtaining nitride and oxide films<br>\nMatt finish treatment for paint (curing)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Main specifications<\/th><td>Wavelength: 172nm, 1lamp, 50mW\/cm\u00b2 specification<br>\nStage moving irradiation system<br>\nNitrogen and\/or CDA feeding possible<br>\nIrradiation distance: 2 to 23mm<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum 300mm square<br>\nSubstrate thickness up to 23mm can be treatment<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>The sample transport stage enables uniform irradiation up to a maximum of 300 mm square<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>","protected":false},"excerpt":{"rendered":"<p>table of contents Lithography\/exposure\/drawing equipment Film formation\/deposition Film processing\/etching Syn [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":12,"menu_order":15,"comment_status":"closed","ping_status":"closed","template":"","meta":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v20.0 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Surface treatment | Facilities | Tohoku University Smart System Super Integration Research Center<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05\" \/>\n<meta property=\"og:locale\" content=\"en_US\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Surface treatment | Facilities | Tohoku University Smart System Super Integration Research Center\" \/>\n<meta property=\"og:description\" content=\"table of contents Lithography\/exposure\/drawing equipment Film formation\/deposition Film processing\/etching Syn [&hellip;]\" \/>\n<meta property=\"og:url\" content=\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05\" \/>\n<meta property=\"og:site_name\" content=\"Tohoku University Smart System Super Integration Research Center\" \/>\n<meta property=\"article:modified_time\" content=\"2026-01-20T05:17:26+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/03\/ogp.jpg\" \/>\n\t<meta property=\"og:image:width\" content=\"1200\" \/>\n\t<meta property=\"og:image:height\" content=\"630\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/jpeg\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Est. reading time\" \/>\n\t<meta name=\"twitter:data1\" content=\"3 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05\",\"url\":\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05\",\"name\":\"Surface treatment | Facilities | Tohoku University Smart System Super Integration Research Center\",\"isPartOf\":{\"@id\":\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/#website\"},\"datePublished\":\"2022-01-12T01:51:04+00:00\",\"dateModified\":\"2026-01-20T05:17:26+00:00\",\"breadcrumb\":{\"@id\":\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05#breadcrumb\"},\"inLanguage\":\"en-US\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[[\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05\"]]}]},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"HOME\",\"item\":\"https:\/\/web.tohoku.ac.jp\/mnc\/en\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Facilities\",\"item\":\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\"},{\"@type\":\"ListItem\",\"position\":3,\"name\":\"Surface treatment\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/#website\",\"url\":\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/\",\"name\":\"Tohoku University Smart System Super Integration Research Center\",\"description\":\"Venture Business Laboratory (VBL), the predecessor of Smart System Super Integration Research Center (SIRC), was established by a fund for creative research projects in the FY 1995 Supplementary Budget of the Japanese government.\",\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/?s={search_term_string}\"},\"query-input\":\"required name=search_term_string\"}],\"inLanguage\":\"en-US\"}]}<\/script>\n<!-- \/ Yoast SEO plugin. -->","yoast_head_json":{"title":"Surface treatment | Facilities | Tohoku University Smart System Super Integration Research Center","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05","og_locale":"en_US","og_type":"article","og_title":"Surface treatment | Facilities | Tohoku University Smart System Super Integration Research Center","og_description":"table of contents Lithography\/exposure\/drawing equipment Film formation\/deposition Film processing\/etching Syn [&hellip;]","og_url":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05","og_site_name":"Tohoku University Smart System Super Integration Research Center","article_modified_time":"2026-01-20T05:17:26+00:00","og_image":[{"width":1200,"height":630,"url":"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/03\/ogp.jpg","type":"image\/jpeg"}],"twitter_card":"summary_large_image","twitter_misc":{"Est. reading time":"3 minutes"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"WebPage","@id":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05","url":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05","name":"Surface treatment | Facilities | Tohoku University Smart System Super Integration Research Center","isPartOf":{"@id":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/#website"},"datePublished":"2022-01-12T01:51:04+00:00","dateModified":"2026-01-20T05:17:26+00:00","breadcrumb":{"@id":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05#breadcrumb"},"inLanguage":"en-US","potentialAction":[{"@type":"ReadAction","target":[["https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05"]]}]},{"@type":"BreadcrumbList","@id":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment05#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"HOME","item":"https:\/\/web.tohoku.ac.jp\/mnc\/en"},{"@type":"ListItem","position":2,"name":"Facilities","item":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities"},{"@type":"ListItem","position":3,"name":"Surface treatment"}]},{"@type":"WebSite","@id":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/#website","url":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/","name":"Tohoku University Smart System Super Integration Research Center","description":"Venture Business Laboratory (VBL), the predecessor of Smart System Super Integration Research Center (SIRC), was established by a fund for creative research projects in the FY 1995 Supplementary Budget of the Japanese government.","potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/?s={search_term_string}"},"query-input":"required name=search_term_string"}],"inLanguage":"en-US"}]}},"_links":{"self":[{"href":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/wp-json\/wp\/v2\/pages\/139"}],"collection":[{"href":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/wp-json\/wp\/v2\/comments?post=139"}],"version-history":[{"count":34,"href":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/wp-json\/wp\/v2\/pages\/139\/revisions"}],"predecessor-version":[{"id":2376,"href":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/wp-json\/wp\/v2\/pages\/139\/revisions\/2376"}],"up":[{"embeddable":true,"href":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/wp-json\/wp\/v2\/pages\/12"}],"wp:attachment":[{"href":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/wp-json\/wp\/v2\/media?parent=139"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}