{"id":130,"date":"2022-01-12T10:37:26","date_gmt":"2022-01-12T01:37:26","guid":{"rendered":"https:\/\/web.tohoku.ac.jp\/mnc\/?page_id=130"},"modified":"2026-01-20T14:22:19","modified_gmt":"2026-01-20T05:22:19","slug":"equipment02","status":"publish","type":"page","link":"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment02","title":{"rendered":"Film formation\/deposition"},"content":{"rendered":"<dl class=\"localnav\">\n\t<dt>table of contents<\/dt>\n\t<dd><ul><li><a href=\"\/mnc\/facilities\/equipment01\">Lithography\/exposure\/drawing equipment<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment02\">Film formation\/deposition<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment03\">Film processing\/etching<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment04\">Synthesis, heat treatment, doping<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment05\">Surface treatment<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment06\">Bonding, polishing, packaging<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment07\">Shape\/morphology observation, analysis<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment08\">Sample preparation equipment<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment09\">Electrical measurement<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment10\">Mechanical measurement<\/a><\/li><li><a href=\"\/mnc\/facilities\/equipment11\">Others<\/a><\/li><\/ul><\/dd>\n<\/dl>\n\n\n\n<h2>Film formation\/deposition<\/h2>\n\n\n\n<h3 id=\"equipment02-29\">2inch RF magnetron sputter(Ulvac)<\/h3>\n\n\n\n<div class=\"wp-container-81 wp-block-columns\">\n<div class=\"wp-container-79 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"360\" src=\"\/mnc\/wp-content\/uploads\/2024\/01\/equipment02-29.jpg\" alt=\"2inch RF magnetron sputter(Ulvac)\" class=\"wp-image-1940\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2024\/01\/equipment02-29.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2024\/01\/equipment02-29-470x353.jpg 470w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-80 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name(Model)<\/th><td>ULVAC<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Temperature<\/th><td>Maximum 500\u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>ProcessGas<\/th><td>Ar<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u23002 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-01\">Plasme TEOS CVD<\/h3>\n\n\n\n<div class=\"wp-container-84 wp-block-columns\">\n<div class=\"wp-container-82 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/11-1.jpg\" alt=\"Plasme TEOS CVD\" class=\"wp-image-822\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/11-1.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/11-1-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-83 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Samco (PD-100ST)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Type<\/th><td>PE-CVD<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>SiO<sub>2<\/sub>,SiOC<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>80\u2013350 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition rate<\/th><td>Approximately 80 nm\/min\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum 6 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-03\">Plasma-enhanced SiN CVD<\/h3>\n\n\n\n<div class=\"wp-container-87 wp-block-columns\">\n<div class=\"wp-container-85 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/14.jpg\" alt=\"Plasma-enhanced SiN CVD\" class=\"wp-image-825\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/14.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/14-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-86 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Samco (PD-220NL)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Type<\/th><td>Plasma CVD (PE-CVD)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>SiN, SiO<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>200\u2013350 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition rate<\/th><td>80 nm\/min<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u23002 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-05\">SiCN Cat-CVD<\/h3>\n\n\n\n<div class=\"wp-container-90 wp-block-columns\">\n<div class=\"wp-container-88 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/17.jpg\" alt=\"SiCN Cat-CVD\" class=\"wp-image-834\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/17.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/17-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-89 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Self-made<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Type<\/th><td>W Wire thermal CVD<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>SiCN (Gas source: HMDS + NH<sub>3<\/sub>)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>150\u2013300 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition rate<\/th><td>2.5\u201350 nm\/min<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u23002 inch, \u25a120 mm<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Catalyst filament: Tungsten (\u23000.5 mm), Filament temperature: 1600\u20131900 \u2103, with heat shield<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-06\">Plasma\/ozone TEOS CVD<\/h3>\n\n\n\n<div class=\"wp-container-93 wp-block-columns\">\n<div class=\"wp-container-91 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/10-3.jpg\" alt=\"Plasma\/ozone TEOS CVD\" class=\"wp-image-836\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/10-3.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/10-3-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-92 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>YOUTEC (21-0266SA)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Type<\/th><td>CVD<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>SiO<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>Approx. 300 nm\/min<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition rate<\/th><td>About300nm\/min<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum 8 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-07\">Plasma CNT-CVD<\/h3>\n\n\n\n<div class=\"wp-container-96 wp-block-columns\">\n<div class=\"wp-container-94 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/01-5.jpg\" alt=\"Plasma CNT-CVD\" class=\"wp-image-840\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/01-5.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/01-5-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-95 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (Manufacturer name) Model)<\/th><td>Self-made<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Type<\/th><td>PE-CVD<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>CNT<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>650\u2013700 \u2103 (measured by a radiation thermometer)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition rate<\/th><td>1 nm, 2 <span class=\"unit_micro\">\u03bc<\/span>m\/min on Fe<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Size that can be placed on a square mesh of about 50 mm<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Example of film formation conditions: 600 V DC plasma, acetylene 10 Pa, hydrogen 100 Pa<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-08\">Plasma diamond CVD(AX3030)<\/h3>\n\n\n\n<div class=\"wp-container-99 wp-block-columns\">\n<div class=\"wp-container-97 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/07-3.jpg\" alt=\"Plasma diamond CVD(AX3030)\" class=\"wp-image-845\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/07-3.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/07-3-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-98 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Seki Technotron (AX5200)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Type<\/th><td>MPECVD<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>Graphene nanowalls, diamond<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>RT\u2013400 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition rate<\/th><td>Low<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>10 \u00d7 10 mm\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Microwave power: 650 W , Gas: H<sub>2<\/sub>, CH<sub>4<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-09\">RF magnetron sputter(Shibaura#1,CFS-4ES)<\/h3>\n\n\n\n<div class=\"wp-container-102 wp-block-columns\">\n<div class=\"wp-container-100 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/12.jpg\" alt=\"RF magnetron sputter(Shibaura#1,CFS-4ES)\" class=\"wp-image-850\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/12.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/12-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-101 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Shibaura Mechatronics (CFS-4ES)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>Metallic and non-metal compatible<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Samples that can be introduced<\/th><td>Durable and particle-free sample\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum 4 inch \u00d7 2<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>RT\u2013300 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Process gas<\/th><td>Ar, O<sub>2<\/sub>, N<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Other<\/th><td>Maximum 300 W, 3 Target can be installed<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-10\">RF magnetron sputter(Shibaura#2,CFS-4ES)<\/h3>\n\n\n\n<div class=\"wp-container-105 wp-block-columns\">\n<div class=\"wp-container-103 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/10-4.jpg\" alt=\"RF magnetron sputter(Shibaura#2,CFS-4ES)\" class=\"wp-image-852\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/10-4.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/10-4-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-104 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Shibaura Eletec (CFS-4ES-232)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Materials that can be formed<\/th><td>Pure metal only (other than magnetic material)\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Samples that can be introduced<\/th><td>A sample that is resistant and does not generate particles\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum 4 inch \u00d7 2<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>Room temperature<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Process gas<\/th><td>Ar<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>3 Targets can be installed<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-12\">Facing target DC sputter<\/h3>\n\n\n\n<div class=\"wp-container-108 wp-block-columns\">\n<div class=\"wp-container-106 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/08-4.jpg\" alt=\"Facing target DC sputter\" class=\"wp-image-862\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/08-4.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/08-4-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-107 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Osaka Vacuum (FTS- R3S)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Materials that can form a film<\/th><td>Fe, Co, Ni<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Samples that can be introduced<\/th><td>Samples that are sputter resistant and do not generate particles\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u25a120 mm\u00d7 4 sheets<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample film formation temperature<\/th><td>RT\u2013400 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Process gas<\/th><td>Ar, Kr, N<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Other<\/th><td>Lift Can be turned off<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-13\">Facing target RF sputter<\/h3>\n\n\n\n<div class=\"wp-container-111 wp-block-columns\">\n<div class=\"wp-container-109 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/04-5.jpg\" alt=\"Facing target RF sputter\" class=\"wp-image-863\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/04-5.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/04-5-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-110 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Osaka Vacuum (FTS-1CL)(FTS-1CL)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>Various metals<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u25a120 mm<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>RT\u2013700 \u00b0 C<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>ProcessGas<\/th><td>Ar<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Organic material NG<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-15\">ECR Sputter<\/h3>\n\n\n\n<div class=\"wp-container-114 wp-block-columns\">\n<div class=\"wp-container-112 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/11-3.jpg\" alt=\"ECR Sputter\" class=\"wp-image-867\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/11-3.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/11-3-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-113 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>JSW Afty (AFTEX EC-2300)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Materials that can be formed]<\/th><td>AlN only<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Samples that can be introduced<\/th><td>Spatter resistant and particles that does not occur\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>4 inch, \u25a120 mm<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Formation temperature<\/th><td>RT\u2013300 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Process gas<\/th><td>Ar + N<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Lift-off not possible<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-16\">ECR ion beam sputter\uff08EIS-220\uff09<\/h3>\n\n\n\n<div class=\"wp-container-117 wp-block-columns\">\n<div class=\"wp-container-115 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/06-3.jpg\" alt=\"ECR ion beam sputter\uff08EIS-220\uff09\" class=\"wp-image-870\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/06-3.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/06-3-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-116 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Elionix (EIS-220)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>Semiconductors, materials for MEMS, etc.<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum 3 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Capsulation temperature<\/th><td>RT\u2013350 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Process gas<\/th><td>Ar, N<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Organic matter OK, lift-off possible<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-17\">RF magnetron sputter(ANELVA#1,SPC-350)<\/h3>\n\n\n\n<div class=\"wp-container-120 wp-block-columns\">\n<div class=\"wp-container-118 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/07-5.jpg\" alt=\"RF magnetron sputter(ANELVA#1,SPC-350)\" class=\"wp-image-874\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/07-5.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/07-5-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-119 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Anelva (SPC-350)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Materials that can be formed<\/th><td>Metal, Si, SiO<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Samples that can be introduced<\/th><td>Spatter resistant and generation of particles No sample\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum \u23002 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>RT\u2013400 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Process gas<\/th><td>Ar, O<sub>2<\/sub>, N<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Organic material NG, lift-off not possible, reactive sputtering possible, load lock chamber available, 3 Target can be installed<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-18\">High-temp RF magnetron sputter(SSP3000)<\/h3>\n\n\n\n<div class=\"wp-container-123 wp-block-columns\">\n<div class=\"wp-container-121 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/01-7.jpg\" alt=\"High-temp RF magnetron sputter(SSP3000)\" class=\"wp-image-878\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/01-7.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/01-7-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-122 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Suga (SSP3000)<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>Metal<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum 2 inch \u00d7 2<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>temperature<\/th><td>RT-600 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Process gas<\/th><td>Ar, N<sub>2<\/sub>, O<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-19\">Thermal oxidation furnace<\/h3>\n\n\n\n<div class=\"wp-container-126 wp-block-columns\">\n<div class=\"wp-container-124 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/03-7.jpg\" alt=\"Thermal oxidation furnace\" class=\"wp-image-881\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/03-7.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/03-7-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-125 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Self-made<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>SiO<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u23002 inch<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Applications (features)<\/th><td>Wet and dry oxidation of Si<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>About 1000 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Main specifications<\/th><td>Gas type: O<sub>2<\/sub>, H<sub>2<\/sub>, N<sub>2<\/sub>\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Mainly for transistor gate insulating film and LOCOS process<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-20\">EB evaporation<\/h3>\n\n\n\n<div class=\"wp-container-129 wp-block-columns\">\n<div class=\"wp-container-127 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/05-5.jpg\" alt=\"EB evaporation\" class=\"wp-image-884\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/05-5.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/05-5-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-128 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>ANELVA (EGP-230)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u25a120 mm,&nbsp;\u23004 inch, etc.<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Applications (features)<\/th><td>Film formation for lift-off, etc<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Main specifications<\/th><td>Film formation is possible with a vacuum degree 10\u22126&nbsp;Torr. Metal film and insulating film can be formed. Titanium and aluminum are shared, but other materials are raw materials and hearth liners are prepared by each person. Magnetic materials such as nickel cannot be deposited. The film thickness can be controlled by a crystal oscillation type film thickness meter.\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Operation between users is prohibited for manual devices. Since the absorber inside the cryopump has a limited life, continuous operation is prohibited all night.\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-21\">Electroplating #1(2401)<\/h3>\n\n\n\n<div class=\"wp-container-132 wp-block-columns\">\n<div class=\"wp-container-130 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"360\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/17e3b3b54b9655346675efce9afd52e2.jpg\" alt=\"Electroplating #1(2401)\" class=\"wp-image-970\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/17e3b3b54b9655346675efce9afd52e2.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/17e3b3b54b9655346675efce9afd52e2-470x353.jpg 470w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-131 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>KEITHLEY (2401 DC current)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Depends on the beaker, solution tank size, and amount of plating solution to bring. 20 \u00d7 20 mm is standard for the range of accessories.<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Application (feature)<\/th><td>Plating mainly by direct current control.<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Prepare the plating solution by yourself.<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-22\">Electroplating #2(HAB-151A)<\/h3>\n\n\n\n<div class=\"wp-container-135 wp-block-columns\">\n<div class=\"wp-container-133 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/13-1.jpg\" alt=\"Electroplating #2(HAB-151A)\" class=\"wp-image-886\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/13-1.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/13-1-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-134 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Hokuto Denko (HAB-151 Potential Shot)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Depends on the beaker, solution tank size, and amount of plating solution to bring. 20 \u00d7 20 mm is standard for the range of accessories.\n<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Applications (features)<\/th><td>Mainly for measurement of redox potential and three-electrode plating. A device for conducting electrochemical experiments by controlling the electric potential.\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td>Prepare the plating solution by yourself. There is an accessory device for conducting experiments on nitrogen gas atmosphere.\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-23\">MBE<\/h3>\n\n\n\n<div class=\"wp-container-138 wp-block-columns\">\n<div class=\"wp-container-136 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/07-7.jpg\" alt=\"MBE\" class=\"wp-image-896\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/07-7.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/07-7-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-137 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Riber (Riber MBE 32 system)\n<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Type<\/th><td>MBE<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>GaN, AlN, InN<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Film film temperature<\/th><td>900 \u2103<\/td>\n\t<\/tr>\n\t\t<tr>\n\t\t<th>Film film rate<\/th><td>100 nm\/h<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u23003 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-24\">Palylene evaporator<\/h3>\n\n\n\n<div class=\"wp-container-141 wp-block-columns\">\n<div class=\"wp-container-139 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/03-9.jpg\" alt=\"Palylene evaporator\" class=\"wp-image-899\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/03-9.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/03-9-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-140 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Specialty Coating System (PDS2010)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum 120 \u00d7 120 mm<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Use<\/th><td>Parylene\n<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Main specifications<\/th><td>Film formation pressure: approximately 3 Pa<br>\nDeposition temperature\uff1aRT<br>\nfilm formation rate: 3 <span class=\"unit_micro\">\u03bc<\/span>m\/h<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-25\">PLD<\/h3>\n\n\n\n<div class=\"wp-container-144 wp-block-columns\">\n<div class=\"wp-container-142 wp-block-column\"><div class=\"wp-block-image\">\n<figure class=\"aligncenter size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2022\/02\/05-7.jpg\" alt=\"PLD\" class=\"wp-image-903\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/05-7.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/02\/05-7-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure><\/div><\/div>\n\n\n\n<div class=\"wp-container-143 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Pascal<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>\u25a120 mm<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Use (features)<\/th><td>Deposit of oxide thin film<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-26\">ALD<\/h3>\n\n\n\n<div class=\"wp-container-147 wp-block-columns\">\n<div class=\"wp-container-145 wp-block-column\">\n<figure class=\"wp-block-image size-full\"><img loading=\"lazy\" width=\"480\" height=\"323\" src=\"\/mnc\/wp-content\/uploads\/2022\/09\/equipment02-26.jpg\" alt=\"ALD\" class=\"wp-image-1694\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/09\/equipment02-26.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2022\/09\/equipment02-26-470x316.jpg 470w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure>\n<\/div>\n\n\n\n<div class=\"wp-container-146 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Cambridge NanoTech (Savannah S100)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Type<\/th><td>Thermal ALD (Atomic Layer Deposition)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Materials that can be deposited<\/th><td>Al<sub>2<\/sub>O<sub>3<\/sub> (TMA + H<sub>2<\/sub>O)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition Temperature<\/th><td>100\u2103\u2013220\u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition rate<\/th><td>0.11 nm\/cycle<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum \u23004 inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-30\">RF magnetron sputter(ANELVA#2,SPC-350UHV)<\/h3>\n\n\n\n<div class=\"wp-container-150 wp-block-columns\">\n<div class=\"wp-container-148 wp-block-column\">\n<figure class=\"wp-block-image size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2025\/04\/rf_magnetron_sputter.jpg\" alt=\"RF magnetron sputter(ANELVA#2,SPC-350UHV)\" class=\"wp-image-2206\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2025\/04\/rf_magnetron_sputter.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2025\/04\/rf_magnetron_sputter-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure>\n<\/div>\n\n\n\n<div class=\"wp-container-149 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>Anelva (SPH-350)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Materials that can be formed<\/th><td>AlN, ScAlN<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Samples that can be introduced<\/th><td>Si, Glass, etc. (photoresist or polymers is NG)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>2cm\u25a1<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition temperature<\/th><td>200\u00b0C<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Process gas<\/th><td>Ar, N<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td>Loading several samples at one time is possible<\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"equipment02-27\">Sputter machine for Pb based complex oxide(SPF-210H)<\/h3>\n\n\n\n<div class=\"wp-container-153 wp-block-columns\">\n<div class=\"wp-container-151 wp-block-column\">\n<figure class=\"wp-block-image size-full\"><img loading=\"lazy\" width=\"480\" height=\"640\" src=\"\/mnc\/wp-content\/uploads\/2024\/01\/equipment02-27.jpg\" alt=\"Sputter machine for Pb based complex oxide(SPF-210H)\" class=\"wp-image-1907\" srcset=\"https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2024\/01\/equipment02-27.jpg 480w, https:\/\/web.tohoku.ac.jp\/mnc\/wp-content\/uploads\/2024\/01\/equipment02-27-353x470.jpg 353w\" sizes=\"(max-width: 480px) 100vw, 480px\" \/><\/figure>\n<\/div>\n\n\n\n<div class=\"wp-container-152 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>ANELVA (SPF-210H)<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Type<\/th><td>RF magnetron sputtering<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>Maximum 2 cm\u25a1<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Materials that can form a film<\/th><td>PZT, PMN-PT<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample film formation temperature<\/th><td>Maximum 600 \u2103<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Deposition rate<\/th><td>400\u2013550 nm\/h<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Process gas<\/th><td>Ar, O<sub>2<\/sub><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td>To use the equipment, you need to consult with the equipment manager of the Shuji Tanaka Laboratory.<\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>\n\n\n\n<h3 id=\"metal_no14\">AlN Sputtering#1<\/h3>\n\n\n\n<div class=\"wp-container-156 wp-block-columns\">\n<div class=\"wp-container-154 wp-block-column\">\n<figure class=\"wp-block-image size-large\"><img src=\"\/mnc\/wp-content\/uploads\/floor_img\/ain-sputtering1.jpg\" alt=\"AlN Sputtering#1\"\/><\/figure>\n<\/div>\n\n\n\n<div class=\"wp-container-155 wp-block-column\">\n<table>\n\t<tbody><tr>\n\t\t<th>Manufacturer name (model)<\/th><td>AMS &#8211; AM2012<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Application<\/th><td>AlN sputtering<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Sample size<\/th><td>4inch<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Application example<\/th><td>Sputteirng AlN film<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Main specifications<\/th><td>Thickness:  &gt; 10nm<\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Others<\/th><td><\/td>\n\t<\/tr>\n\t<tr>\n\t\t<th>Remarks<\/th><td><\/td>\n\t<\/tr>\n<\/tbody><\/table>\n<\/div>\n<\/div>","protected":false},"excerpt":{"rendered":"<p>table of contents Lithography\/exposure\/drawing equipment Film formation\/deposition Film processing\/etching Syn [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":12,"menu_order":12,"comment_status":"closed","ping_status":"closed","template":"","meta":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v20.0 - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Film formation\/deposition | Facilities | Tohoku University Smart System Super Integration Research Center<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/web.tohoku.ac.jp\/mnc\/en\/facilities\/equipment02\" \/>\n<meta property=\"og:locale\" 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